Линеарни водич у области полуводичке предности за обраду се полуводича
Линеарни водич у области полуводичке плоче за прераду значајних предности, посебно се одражава на следеће аспекте:
Позиционирање високо прецизности: Као одговор на потражњу за великом прецизношћу у процесу фотолиттографије, усвојен је керамички линеарни водич, са храпавошћу РА<0.05μm after special polishing treatment, and with advanced drive and feedback system, sub-micrometer accurate positioning can be realized. This ensures the precise alignment of the mask plate and wafer in the photolithography process, guaranteeing the accuracy of the chip's critical dimensions (CD), such as a 12-inch wafer fab after the application of the key dimensions of the chip manufacturing deviation reduced by 40%, which greatly improves the precision and yield of chip manufacturing.
High cleanliness: semiconductor manufacturing environment requires a very high℃of cleanliness, ceramic linear guide itself is not easy to adsorb particles, and can run stably in a vacuum environment, effectively reducing the impurities generated by the guide on the wafer pollution, to avoid defects due to the particles adhering to the chip caused by the chip, to ensure that the chip manufacturing process of cleanliness.
High stability and strong responsiveness: in etching and other processes, wafer processing, there are frequent start-stop and direction change, optimized ball circulation system after the linear guide, can make the slider commutation acceleration up to 15G, at the same time, the smoothness of movement error control at ± 0.002mm, to ensure that the complex movement conditions can still be stable operation for the continuity of wafer processing and stability to provide protection, improve production Ефикасност . Систем је дизајниран да пружи континуитет и стабилност за прераду решетка и побољшање ефикасности производње.
